sputtering的例句大全

It was also found that Ag is the preferential sputtering element for the AgNi alloys.

并发现该系统Ag是择优溅射元素.

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Metal aluminum films were deposited on AAO templates by radio frequency magnetron sputtering.

用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜.

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AAM offers 99.95 % ~99.995 % pure Ta sputtering Target for data storage and other thin film applications.

中精伦为数据存储和半导体行业提供高纯钽靶,产品纯度在99.95%-99.995%.

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Boron carbon nitride ( BCN ) thin films were deposited by radio frequency ( RF ) magnetron sputtering .

采用射频 磁控溅射 技术制备出硼碳氮 ( BCN ) 薄膜.

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For binary target, it is shown that the preferential sputtering is independent of atomic radius.

在双元靶严格解的基础上, 证明了泽优溅射与原子的半径大小无关.

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Depth crystalline evolution property for microcrystalline Si films deposited by ion beam sputtering was studied.

研究了离子束溅射制备微晶硅薄膜的生长纵向结晶演化过程.

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Suddenly, the car started chugging and sputtering until finally the engine quit altogether.

忽然, 车子先是发出嘎嚓声,然后又是劈啪声,终于发动机彻底歇工了.

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A new method, which synthesizes tantalum film by a sputtering cathode , has been introduced.

介绍了一种新型的在钢铁基体上制备钽薄膜的方法.

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The crystal growth by glow discharge sputterings and ion beam sputterings and thecrystal epitaxy are introduced.

介绍了气相中晶体生长的方法,如辉光放电溅射法和离子束溅射沉积法以及晶体外延生长的方法.

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Methods: The nature HA films were prepared by electron beam evaporation and rf-magnetron sputtering techniques.

方法: 用电子束蒸发和射频磁控溅射两种技术制备了天然HA薄膜.

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The silicon thin films on glass substrate were prepared using microwave ECR source enhanced magnetron sputtering.

利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜.

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Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.

采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜.

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Ion sputtering yields on T ? Ti target are numerically calculated with TRIM program.

应用trim程序模拟了离子在氚钛靶上的溅射产额.

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Technical manuals of a company: glass-sandblasting machine. Glass Sputtering Plant maintenance.

某公司技术操作手册: 玻璃喷砂机.

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In the fourth chapter Sb-doped TiO 2 thin films prepared by DC reactive magnetron sputtering were studied.

第五章研究了直流磁控溅射制备Sb掺杂 TiO2的成膜特点.

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Silicon dioxide thin films were prepared by reactive RF magnetron sputtering on silicon substrate.

采用磁控射频反应溅射法在单晶硅片上制备了二氧化硅薄膜.

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The kinetic process of reactive magnetron sputtering has been studied.

研究了反应磁控溅射的动力学过程.

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Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.

利用低频反应磁控溅射制备五氧化二铌光学薄膜.

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Magnetically controlled cathod plasma sputtering technique was used to manufacture the plating manganin film.

用磁控溅射低温沉积镀膜技术制做锰铜薄膜,能够保持薄膜中锰、铜、镍成份的相对稳定和锰铜合金正六面三元固溶体金相结构的特性.

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With other global engines of growth sputtering, that's not to be sneezed at.

在全球其他经济增长引擎都运转不畅的情况下, 这一承诺不容小视.

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