lithography

[lɪˈθɒgrəfi]
  • lithography
  • n.

    平版印刷术;石印;

纠错 数据更新时间:2026-02-27 10:55:52
  • 知识拓展

    词源考究

    来自lithography,石版印刷。

1、

Measurement system of precision stage shows its important role for the correction technology E-Beam lithography machine.

由于电子束曝光机采用的修正技术,工件台的测量系统显得十分重要.

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2、

A process for printing from a smooth surface, as lithography or offset.

利用金属或石头表面的平版印刷.

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3、

However, the term lithography is generally in the sense of and in its shortened form : Litho.

可是间接 石印 的名称并不流行, 一般用“平版”一词代替.

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4、

Thus it is the reasonable basis to put forward extending the waterless lithography printing in China.

从而为在我国推广普及无水胶印提供了合理的依据.

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5、

Litho: Short for Lithography. Also called Offset.

平版: 英文是简写. 亦称柯式.

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6、

E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.

因此目前电子束光刻设备主要的用途是用于刻制掩膜板,许多人甚至认为电子束光刻技术的产出量永远也无法满足芯片量产的需求。

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7、

Composition rich in imaginative design, lithography wonderful way abnormal.

设计构图想象力丰富, 刻制手法异常奇妙.

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8、

The room temperature imprint lithography has overcome many difficulties appeared HEL and has high resolution.

针对热压印光刻工艺中因热变形而导致精度丧失的问题,提出了冷压印光刻.

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9、

Thick resist lithography is one kind of micromachining techniques fabricating relief microstructures at great depth.

厚层抗蚀剂光刻是一种制作深浮雕结构的微细加工技术.

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10、

By Fourier transform, produces a fast and accurate calculation for dose precompensation in proximity effect correction for electron beam lithography.

将付里叶变换法运用于电子束曝光的邻近效应校正中,形成了快速、准确的剂量校正法。

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11、

A Study on Laser Scan Strategy of Stereo Lithography ( SL) Based on Layers' Characteristics

基于层特征的快速成型激光扫描策略的研究

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12、

The new source function was used to build a new lithography model based on SPLAT.

在SPLAT的基础上应用新的光源特征函数,建立新的光源模型,并结合测试模板进行仿真.

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13、

And because it is a lithography business card printing, on the flatness of the rubber blanket.

又由于是平版制卡, 所以差橡皮布的裂缝量请求很矮.

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14、

What is meant by indirect lithography business card printing making and membership card?

何谓不不不直接平版制卡和会员卡制息?

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15、

Using nanosphere lithography laser deposition , Au nanoparticles with different height have been fabricated on quartz substrates.

采用纳米球蚀刻技术在石英衬底上制备了不同高度的金纳米颗粒阵列.

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16、

Based on lithography technology , the electrochemical lamella machining ( ECLM ) by frequency group pulses was experimentally studied.

进行了基于光刻技术的高频群脉冲微细电化学薄片加工 ( ECLM ) 试验研究.

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17、

First, a silicone mould is built by means a stereo lithography pattern of the mould.

首先用立体层叠法造出一个硅树脂模具.

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18、

Electron beam lithography machine is the key instrument for mask making and research of nanometer device.

电子束曝光技术是掩模版制作和纳米器件研究的主要手段。

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19、

One of the most important module improvement is the combination of new LOCOS process development with poly gate lithography process.

关键工艺模块之一是新的LOCOS开发与硅栅光刻工艺改善的结合。

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20、

In this paper, Focused Ion Beam Lithography technology and is introduced.

对聚焦离子束曝光技术作了介绍.

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21、

The graphic arts include calligraphy and lithography.

平面造型艺术包括书法和平版印刷术.

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22、

Study on Zone Plate Replication Using Hot Embossing Lithography Technology

热压印光刻技术复制波带片图形研究

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23、

The basic steps of the technology are: first manufacturing prototype using Stereo Lithography Apparatus, and then making mold using the prototype, and last molding product by reaction injection molding.

基本步骤为:首先使用立体光固化快速成型设备制造制品的原型,再以原型为基础模型快速制造模具,然后使用反应注射成型设备快速加工制品。

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24、

The new set of models are more proper for lithography simulation for thick SU-8 resist.

对于厚SU-8胶的模拟,这种模型比普通的模拟模型更加合适。

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25、

A process for printing from a smooth surface, as lithography offset.

照相(影印)平版印刷(法)根据摄影图像制作的,使用印版的平面印刷过程.

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26、

Needle etching, lithography and gravure gravure business card printing belongs to and membership card.

蚀刻 、 针刻和拍照不不凹版都属于不不凹版制卡和会员卡制息.

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27、

Exposure intensity effect on the photochemical reaction speed in the lithography for thick film photo-resists

厚胶光刻中曝光光强对光化学反应速率的影响

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28、

Lithography and Reactive Ion Etching of Silicon-Based Photon Crystal Slab

硅基光子晶体板的光刻和反应离子刻蚀

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29、

Methods of proximity effect correction in electron beam lithography

电子束光刻中邻近效应校正的几种方法

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30、

It also analysed the finite element method and its application in the lithography protype development and simulation analysis phase.

本文概述了国内外光刻机工件台的研究现状,分析了有限元法在光刻机样机研制过程中仿真分析的应用。

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